Configuration: AIX G5 WW C (SiC) Planetary Reactor for deposition on 8 x150 mm wafers , 2022 model MOCVD system with automated wafer transfer module, 1 Epison 5 and EpiCurve TT® AR 3W. Gas Distribution Confirgured as follows: Hydride Lines : C3H8 x 3 , HCl x 1, NN x 1, MO Source / Dopant Lines : TCS x 1, TMAl x 2, - Best performance for Next Generation SiC Power Electronics - High throughput batch epitaxy with single wafer control - combining best of both worlds. Key Benefits -Best in class throughput and lowest cost of ownership per wafer -Single wafer performance in batch configuration fo